Laser Annealing Processes in Semiconductor Technology: theory, modeling and applications in nanoelectronics

Fuccio Cristiano from Materials and Processes for Nanoelectronics - MPN team of LAAS-CNRS and Antonino La Magna from the CNR-IMM laboratory of Catania, Italy have recently published a book entitled « Laser Annealing Processes in Semiconductor Technology. Theory, modeling and applications in nanoelectronics ».

In the history of semiconductor device fabrication, annealing is one of the critical process steps used to achieve targeted device performances. For the majority of semiconductor manufacturing process steps, the requirements in terms of thermal budget have always followed a descending trend through the reduction of the time spent at the highest process temperature. Today, the current developments move toward 3D integrated circuits to answer the growing demand for increased functionality and performance. Within this context, laser annealing stands as an excellent solution for achieving ultra-low thermal budget heating with nanometre resolution and hence locally modify the inner properties of extremely small materials’ regions.

This book discusses the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. It first provides an overview of the laser–matter interactions of materials and recent advances in the modeling of laser related phenomena, and then the bulk of the book focuses on the current and emerging (beyond-CMOS) applications of laser annealing processes. Applications reviewed include laser annealing of group IV planar and nanostructured semiconductor materials for both nanoelectronics and optoelectronics devices, where specific physical properties are engineered by laser treatments, ranging from electrical and optical doping, to superconductivity, and insulator–conductor transitions.

Overview