The means of characterization in clean room allow studies and validation of the different step of process for component’s realization. This means are in free service after training.
The characterizations of finished component are doing on the electrical characterization area.
Means of Charactérization
Métrologie du masqueur laser
Observations at all scale (optical microscopy, SEM, AFM), physical characterization (ellipsometry, EDS in SEM), topography characterization (optical and mechanical profilometer), surface energy (water droplet contact angle).
AFM image of photonic crystal
AFM image of a membrane
3D image with the optical profilometer (MEMS-RF)
Topogrphy image (left) and leakage current (right) obtain with tunneling mode on NiFe/PTCTE/Co layer.