Publications personnelle

150documents trouvés

09301
10/06/2009

Miniaturization and integration of carbon-based electrochemical capacitors: technological issues

D.PECH, M.BRUNET, H.DUROU, P.L.TABERNA, P.SIMON, N.FABRE, F.MESNILGRENTE, V.CONEDERA

ISGE, N2IS, CIRIMAT, TEAM

Manifestation sans acte : First International Symposium on Enhanced Electrochemical Capacitors (ISEECap'), Nantes (France), 29 Juin - 2 Juillet 2009, 1p. , N° 09301

Diffusable

117870
09659
08/06/2009

Synthesis process of nanostructured energetic material Al/CuO: nanowires on substrate

M.PETRANTONI, C.ROSSI, V.CONEDERA, D.BOURRIER, C.TENAILLEAU, P.ALPHONSE, H.PEZOUS, X.DOLLAT, F.MATHIEU

N2IS, TEAM, CIRIMAT, 2I

Manifestation avec acte : E-MRS 2009, Strasbourg (France), 8-12 Juin 2009 , N° 09659

Diffusable

120157
09293
01/05/2009

Fabrication and caracterization of carbon micro-supercapacitors elaborated by inkjet deposition

D.PECH, M.BRUNET, H.DUROU, F.MESNILGRENTE, N.FABRE, V.CONEDERA, P.L.TABERNA, P.SIMON

ISGE, N2IS, TEAM, CIRIMAT

Manifestation sans acte : New Energy Solution in Tours (NEST 2009), Tours (France), 26-27 Mai 2009, 1p. (Résumé) , N° 09293

Diffusable

117810
07731
01/03/2009

CuO nanowires grown frm Cu film heated under a N2/O2 flow

K.ZHANG, C.ROSSI, C.TENAILLEAU, V.CONEDERA

CIRIMAT, TEAM, N2IS

Revue Scientifique : Journal of Nanoscience and Nanotechnology, Vol.9, N°2, pp.1418-1422, 1 Mars 2009 , N° 07731

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Mots-Clés / Keywords
Pure; Aligned; CuO nanowire; Copper thin film; Silicon; N2/O2 gas flow;

119674
08628
01/02/2009

Fabrication of activated carbon electrodes by inkjet deposition

V.CONEDERA, F.MESNILGRENTE, M.BRUNET, N.FABRE

ISGE, TEAM

Manifestation avec acte : The Fourth International Conference on Systems (ICONS 2009), Cancun (Mexique), 1-6 Février 2009, 5p. , N° 08628

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116674
08832
01/12/2008

Ink-jet printed carbon-based micro supercapacitor for mobile self-powered modules

M.BRUNET, P.L.TABERNA, P.SIMON, N.FABRE, V.CONEDERA, F.MESNILGRENTE, H.DUROU, C.ROSSI

ISGE, CIRIMAT, TEAM, N2IS

Manifestation avec acte : 2008 MRS Fall Meeting, Boston (USA), 1-5 Décembre 2008, 6p. , N° 08832

Diffusable

117868
08629
01/11/2008

Study of a highly localized activated carbon deposition process using inkjet printing technology

V.CONEDERA, F.MESNILGRENTE, M.BRUNET, M.BORELLA, N.FABRE

TEAM, ISGE, Altatech Semicond.

Manifestation avec acte : Journées Nationales sur les Technologies Emergentes en Micro-nanofabrication, Toulouse (France), 19-21 Novembre 2008, 2p. , N° 08629

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Abstract

An activated carbon deposition technique based on inkjet printing is proposed for the fabrication of supercapacitors electrodes. By mastering the activated carbon suspension in ethylene glycol through use of a surfactant and by utilizing a substrate treatment with OTS, 10¼m wide structures have been obtained with 50¼m ink jet nozzles.

115715
08557
01/09/2008

High performances of new microhotplate for gas sensors

P.MENINI, H.CHALABI, N.YOBOUE, V.CONEDERA, L.SALVAGNAC, K.AGUIR

M2D, TEAM, L2MP

Manifestation avec acte : Eurosensors XXII, Dresde (Allemagne), 7-10 Septembre 2008, 3p. , N° 08557

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Mots-Clés / Keywords
Microtechnology; Microhotplate; Semi-conducting gas sensors;

115438
08009
23/01/2008

Nanomatériaux énergétiques intégrés sur Si: nano fabrication, caractérisation et perspective d'utilisation

K.ZHANG, C.ROSSI, D.ESTEVE, L.SALVAGNAC, V.CONEDERA, M.DILHAN

MIS, TEAM

Rapport LAAS N°08009, Janvier 2008, 50p.

Diffusion restreinte

112695
07453
01/12/2007

SU-8 as a structural material for labs-on-chips and MEMS

P.ABGRALL, V.CONEDERA, H.CAMON, A.M.GUE, N-T. NGUYEN

MIS, TEAM, NTU, Nanyang

Revue Scientifique : Electrophoresis, Vol.28, N°24, pp.4539-4551, Décembre 2007 , N° 07453

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Plus d'informations

Abstract

Since its introduction in the nineties, the negative resist SU-8 has been increasingly used in micro- and nanotechnologies. SU-8 has made the fabrication of high-aspect ratio structures accessible to labs with no high-end facilities such as X-ray lithography systems or deep reactive ion etching systems. These low-cost techniques have been applied not only in the fabrication of metallic parts or molds, but also in numerous other micromachining processes. Its ease of use has made SU-8 to be used in many applications, even when high-aspect ratios are not required. Beyond these pattern transfer applications, SU-8 has been used directly as a structural material for microelectromechanical systems and microfluidics due to its properties such as its excellent chemical resistance or the low Young modulus. In contrast to conventional resists, which are used temporally, SU-8 has been used as a permanent building material to fabricate microcomponents such as cantilevers, membranes, and microchannels. SU-8-based techniques have led to new low-temperature processes suitable for the fabrication of a wide range of objects, from the single component to the complete lab-on-chip. First, this article aims to review the different techniques and provides guidelines to the use of SU-8 as a structural material. Second, practical examples from our respective labs are presented.

Mots-Clés / Keywords
Lab on chip; Microelectronical systems; Microtechnologies; SU-8;

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