Laboratoire d’Analyse et d’Architecture des Systèmes
D.PECH, M.BRUNET, H.DUROU, P.L.TABERNA, P.SIMON, N.FABRE, F.MESNILGRENTE, V.CONEDERA
ISGE, N2IS, CIRIMAT, TEAM
Manifestation sans acte : First International Symposium on Enhanced Electrochemical Capacitors (ISEECap'), Nantes (France), 29 Juin - 2 Juillet 2009, 1p. , N° 09301
Diffusable
117870M.PETRANTONI, C.ROSSI, V.CONEDERA, D.BOURRIER, C.TENAILLEAU, P.ALPHONSE, H.PEZOUS, X.DOLLAT, F.MATHIEU
N2IS, TEAM, CIRIMAT, 2I
Manifestation avec acte : E-MRS 2009, Strasbourg (France), 8-12 Juin 2009 , N° 09659
Diffusable
120157D.PECH, M.BRUNET, H.DUROU, F.MESNILGRENTE, N.FABRE, V.CONEDERA, P.L.TABERNA, P.SIMON
ISGE, N2IS, TEAM, CIRIMAT
Manifestation sans acte : New Energy Solution in Tours (NEST 2009), Tours (France), 26-27 Mai 2009, 1p. (Résumé) , N° 09293
Diffusable
117810K.ZHANG, C.ROSSI, C.TENAILLEAU, V.CONEDERA
CIRIMAT, TEAM, N2IS
Revue Scientifique : Journal of Nanoscience and Nanotechnology, Vol.9, N°2, pp.1418-1422, 1 Mars 2009 , N° 07731
Diffusable
Plus d'informations
V.CONEDERA, F.MESNILGRENTE, M.BRUNET, N.FABRE
ISGE, TEAM
Manifestation avec acte : The Fourth International Conference on Systems (ICONS 2009), Cancun (Mexique), 1-6 Février 2009, 5p. , N° 08628
Diffusable
116674M.BRUNET, P.L.TABERNA, P.SIMON, N.FABRE, V.CONEDERA, F.MESNILGRENTE, H.DUROU, C.ROSSI
ISGE, CIRIMAT, TEAM, N2IS
Manifestation avec acte : 2008 MRS Fall Meeting, Boston (USA), 1-5 Décembre 2008, 6p. , N° 08832
Diffusable
117868V.CONEDERA, F.MESNILGRENTE, M.BRUNET, M.BORELLA, N.FABRE
TEAM, ISGE, Altatech Semicond.
Manifestation avec acte : Journées Nationales sur les Technologies Emergentes en Micro-nanofabrication, Toulouse (France), 19-21 Novembre 2008, 2p. , N° 08629
Diffusable
Plus d'informations
An activated carbon deposition technique based on inkjet printing is proposed for the fabrication of supercapacitors electrodes. By mastering the activated carbon suspension in ethylene glycol through use of a surfactant and by utilizing a substrate treatment with OTS, 10¼m wide structures have been obtained with 50¼m ink jet nozzles.
P.MENINI, H.CHALABI, N.YOBOUE, V.CONEDERA, L.SALVAGNAC, K.AGUIR
M2D, TEAM, L2MP
Manifestation avec acte : Eurosensors XXII, Dresde (Allemagne), 7-10 Septembre 2008, 3p. , N° 08557
Diffusable
Plus d'informations
K.ZHANG, C.ROSSI, D.ESTEVE, L.SALVAGNAC, V.CONEDERA, M.DILHAN
MIS, TEAM
Rapport LAAS N°08009, Janvier 2008, 50p.
Diffusion restreinte
112695P.ABGRALL, V.CONEDERA, H.CAMON, A.M.GUE, N-T. NGUYEN
MIS, TEAM, NTU, Nanyang
Revue Scientifique : Electrophoresis, Vol.28, N°24, pp.4539-4551, Décembre 2007 , N° 07453
Diffusable
Plus d'informations
Since its introduction in the nineties, the negative resist SU-8 has been increasingly used in micro- and nanotechnologies. SU-8 has made the fabrication of high-aspect ratio structures accessible to labs with no high-end facilities such as X-ray lithography systems or deep reactive ion etching systems. These low-cost techniques have been applied not only in the fabrication of metallic parts or molds, but also in numerous other micromachining processes. Its ease of use has made SU-8 to be used in many applications, even when high-aspect ratios are not required. Beyond these pattern transfer applications, SU-8 has been used directly as a structural material for microelectromechanical systems and microfluidics due to its properties such as its excellent chemical resistance or the low Young modulus. In contrast to conventional resists, which are used temporally, SU-8 has been used as a permanent building material to fabricate microcomponents such as cantilevers, membranes, and microchannels. SU-8-based techniques have led to new low-temperature processes suitable for the fabrication of a wide range of objects, from the single component to the complete lab-on-chip. First, this article aims to review the different techniques and provides guidelines to the use of SU-8 as a structural material. Second, practical examples from our respective labs are presented.