405documents trouvés
Réflecteur passif basé sur la transduction EM pour la mesure sans fil de la pression
M. M.JATLAOUI, F.CHEBILA, P.PONS, H.AUBERT
MINC
Manifestation avec acte : Journées Maghreb-Europe, Tabarka (Tunisie), 20-22 Octobre 2010, 1p. (Résumé) , N° 10575
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122915Assessment of dielectric charging in electrostatically actuated MEMS devices: A comparison of available characterization techniques
U.ZAGHLOUL HEIBA, M.KOUTSOURELI, H.WANG, F.COCCETTI, G.J.PAPAIOANNOU, P.PONS, R.PLANA
MINC, Athenes
Manifestation avec acte : European Symposium on Reliability of Electron Devices Failure Physics and Analysis (ESREF 2010), Gaeta (Italie), 11-15 Octobre 2010, 6p. , N° 10632
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122856Methods to improve reliability of bulge test technique to extract mechanical properties of thin films
H.YOUSSEF, A.FERRAND, P.F.CALMON, P.PONS, R.PLANA
MINC, ICA, TEAM
Manifestation avec acte : European Symposium on Reliability of Electron Devices Failure Physics and Analysis (ESREF 2010), Gaeta (Italie), 11-15 Octobre 2010, 6p. , N° 10581
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122858On the impact of relative humidity and environment gases on dielectric charging process in capacitive RF MEMS switches based on kelvin probe force microscopy
U.ZAGHLOUL HEIBA, B.BHUSHAN, P.PONS, G.J.PAPAIOANNOU, F.COCCETTI, R.PLANA
MINC, NLBB, Athenes
Manifestation avec acte : International Symposium on Science and Technology of Materials, Interfaces and Processing (AVS 2010), Albuquerque (USA), 17-22 Octobre 2010, 1p. , N° 10968
Lien : http://hal.archives-ouvertes.fr/hal-00670146
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Plus d'informations
Abstract
Dielectric charging is among the major reliability issues that have prevented the commercialization of RF-MEMS Capacitive switches in spite of the extensive study performed on the topic. Moreover, a little work has been performed to study the effect of the relative humidity (RH) and environment gases on the dielectric charging process. In this work we present the effect of RH and the environment gases on the charging/discharging processes in PECVD silicon nitride films based on Kelvin Probe Force Microscopy (KPFM) methodology. The measurements have been performed in ambient air and under N2 flow, both under different RH levels (from 6% to 40% RH). In addition, the influence of the dielectric film thickness, SiN deposition conditions and the substrate nature on the charging process have been investigated under different environment conditions. This has been done through depositing SiN films with different thicknesses ranges from 100nm to 400nm over bare silicon substrates and over evaporated Au layers and using both Low Frequency(LF) and High Frequency(HF) PECVD deposition modes.
Multi-physical characterization of micro-contact materials for MEMS switches
A.BROUE, J.DHENNIN, P.L.CHARVET, P.PONS, N.BEN JEMAA, F.COCCETTI, R.PLANA
NOVAMEMS, CEA, MINC, Rennes
Manifestation avec acte : IEEE Holm Conference on Electrical Contacts, Charleston (USA), 4-7 Octobre 2010, 10p. , N° 10957
Lien : http://hal.archives-ouvertes.fr/hal-00670153
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Abstract
A systematic comparison between several pairs of contact materials based on an innovative methodology early developed at NOVA MEMS is hereby presented. The technique exploits a commercial nanoindenter coupled with electrical measurements, and test vehicles specially designed in order to investigate the underlying physics driving the surface-related failure modes. The study provides a comprehensive understanding of micro-contact behavior with respect to the impact of low- to medium levels of electrical current. The decrease of the contact resistance, when the contact force increases, is measured for contact pairs of soft material (Au/Au contact), harder materials (Ru/Ru and Rh/Rh contacts) and mixed configuration (Au/Ru and Au/Ni contacts). The contact temperatures have been calculated and compared to the theoretical values of softening temperature for each couple of contact materials. This threshold temperature is reached for gold, ruthenium and rhodium material, with different levels of current intensity. In spite of that, no oftening behavior has been observed for mixed contact at the theoretical softening temperature of both materials. Hence, considering the sensitivity to power handling and the related failure echanisms, namely the contact adhesion, the enhanced resilience of the bimetallic contacts Au/Ru and Au/Ni was demonstrated. Finally focusing on the temperature distribution around the hottest levels on the surface contact interface, these results have been theoretically investigated.
Original identification technique of passive EM sensors using loaded transmission delay lines
M. M.JATLAOUI, F.CHEBILA, S.BOUAZIZ, P.PONS, H.AUBERT
MINC
Manifestation avec acte : European Microwave Week 2010 (EuMC 2010), Paris (France), 26 Septembre - 1 Octobre 2010, pp.1106-1109 , N° 10395
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123355Metallic layer for EM pressure sensor sensitivity improvement
S.BOUAZIZ, M. M.JATLAOUI, D.MINGLI, P.PONS, H.AUBERT
MINC, EXT, M2D
Manifestation avec acte : Micromechanics and Micro systems Europe Workshop (MME'10), Enschende (Pays Bas), 26-29 Septembre 2010, 3p. , N° 10467
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124061Fluidic variable inductor using SU8 channel
I.EL GMATI, P.F.CALMON, R.FULCRAND, S.PINON, A.BOUKABACHE, P.PONS, M.A.KALLALA
TEAM, N2IS, MINC, Monastir
Manifestation avec acte : Micromechanics and Micro systems Europe Workshop (MME'10), Enschende (Pays Bas), 26-29 Septembre 2010, 4p. , N° 10469
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124060Design and development of a millimetre-wave novel passive ultrasensitive temperature transducer for remote sensing and identification
T.THAI, F.CHEBILA, M. M.JATLAOUI, P.PONS, H.AUBERT, G.R.DEJEAN, M.M.TENTZERIS, R.PLANA
MINC, Microsoft Research, Georgia Institute
Manifestation avec acte : European Microwave Week 2010 (EuMC 2010), Paris (France), 26 Septembre - 1 Octobre 2010, pp.45-48 , N° 10433
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123354Liquid RF MEMS variable inductor
I.EL GMATI, P.F.CALMON, A.BOUKABACHE, P.PONS, H.BOUSSETTA, M.A.KALLALA, KBESBES
TEAM, N2IS, MINC, M2D, Monastir
Manifestation avec acte : Eurosensors XXIV, Linz (Autriche), 5-8 Septembre 2010, 2p. , N° 10428
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