The means of characterization in clean room allow studies and validation of the different step of process for component’s realization. This means are in free service after training.
The characterizations of finished component are doing on the electrical characterization area.

Means of Charactérization

AFM with force, thermal and electrical module

Dual Beam (SEM + FIB) FEI Hélios 600i

SEM Hitachi S4800 and MEBS3700N

Mecanic profilmeter KLA Tencor
P15 et P16+

Optical profilmeter Veeco

Ellipsometer Horiba Jobin Yvon

Resistivity meter

Contact angle and surface energy measurement

Confocal microscope

Optical microscope


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Observations at all scale (optical microscopy, SEM, AFM), physical characterization (ellipsometry, EDS in SEM), topography characterization (optical and mechanical profilometer), surface energy (water droplet contact angle).

AFM image of photonic crystal

AFM image of a membrane

3D image with the optical profilometer (MEMS-RF)

Topogrphy image (left) and leakage current (right) obtain with tunneling mode on NiFe/PTCTE/Co layer.